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Ion beam-induced chemical vapor deposition with hexamethyldisilane for hydrogenated amorphous silicon carbide and silicon carbonitride films
Takaomi Matsutani, Tatsuya Asanuma, Chang Liu, Masato Kiuchi, Takae TakeuchiVolume:
169-170
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0257-8972(03)00130-0
File:
PDF, 443 KB
english, 2003