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Plasma immersion ion implantation of TiAl using chlorine containing plasma
U. Hornauer, E. Richter, E. Wieser, W. Möller, A. Donchev, M. SchützeVolume:
174-175
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(03)00453-5
File:
PDF, 300 KB
english, 2003