Characteristics of VHF-excited SiH4/H2 plasmas using a...

Surface and Coatings Technology 2003 Vol. 174-175; Iss. none

Characteristics of VHF-excited SiH4/H2 plasmas using a ladder-shaped electrode

Hiroshi Mashima, Yoshiaki. Takeuchi, Masayoshi Murata, Matsuhei Noda, Hiromu Takatsuka, Ikutarou Kawasaki, Yoshinobu Kawai
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Volume:
174-175
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(03)00526-7
File:
PDF, 139 KB
english, 2003
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