Investigation on the origin of dielectric constant evolution in films deposited from organosilicon molecules in microwave DECR plasma reactor
A. Zenasni, P. Raynaud, S. Sahli, S. Rebiai, Y. SeguiVolume:
174-175
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0257-8972(03)00538-3
File:
PDF, 103 KB
english, 2003