Investigation on the origin of dielectric constant...

Investigation on the origin of dielectric constant evolution in films deposited from organosilicon molecules in microwave DECR plasma reactor

A. Zenasni, P. Raynaud, S. Sahli, S. Rebiai, Y. Segui
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Volume:
174-175
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0257-8972(03)00538-3
File:
PDF, 103 KB
english, 2003
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