Remote nitridation of silicon surface by Ar/N2-fed expanding thermal plasma
G. Dinescu, M. Creatore, M.C.M. van de SandenVolume:
174-175
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(03)00554-1
File:
PDF, 209 KB
english, 2003