Fundamental mechanisms of titanium nitride formation by...

Surface and Coatings Technology 1992 Vol. 54-55; Iss. part-P1

Fundamental mechanisms of titanium nitride formation by d.c. magnetron sputtering

F. Richter, H. Kupfer, H. Giegengack, G. Schaarschmidt, F. Scholze, F. Elstner, G. Hecht
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Volume:
54-55
Year:
1992
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(09)90073-1
File:
PDF, 468 KB
english, 1992
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