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Characterization of titanium nitride films prepared by d.c. reactive magnetron sputtering at different nitrogen pressures
Li-Jian Meng, M.P. dos SantosVolume:
90
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0257-8972(96)03094-0
File:
PDF, 593 KB
english, 1997