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Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films
R.A. Synowicki, Jeffrey S. Hale, R.D. Kubik, S. Nafis, John A. WoollamVolume:
90
Year:
1997
Language:
english
Pages:
6
DOI:
10.1016/s0257-8972(96)03111-8
File:
PDF, 992 KB
english, 1997