Etching characteristics of Si and SiO2 with a low energy...

Surface and Coatings Technology 1997 Vol. 97; Iss. 1-3

Etching characteristics of Si and SiO2 with a low energy argon/hydrogen d.c. plasma source

A Strass, W Hansch, P Bieringer, A Neubecker, F Kaesen, A Fischer, I Eisele
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
97
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(97)00144-8
File:
PDF, 212 KB
english, 1997
Conversion to is in progress
Conversion to is failed