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Surface modelling of reactive ion etching of silicon–germanium alloys in a SF6 plasma
M.C. Peignon, G. Turban, C. Charles, R.W. BoswellVolume:
97
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0257-8972(97)00221-1
File:
PDF, 132 KB
english, 1997