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Study of oxygen/TEOS plasmas and thin SiOx films obtained in an helicon diffusion reactor
F. Nicolazo, A. Goullet, A. Granier, C. Vallée, G. Turban, B. GrolleauVolume:
98
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0257-8972(97)00295-8
File:
PDF, 686 KB
english, 1998