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Emission actinometric investigations of atomic hydrogen and CH radicals in plasma-enhanced chemical vapour deposition processes of hexamethyldisiloxane
V. Shogun, A. Tyablikov, St. Schreiter, W. Scharff, T. Wallendorf, S. MarkeVolume:
98
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(97)00363-0
File:
PDF, 674 KB
english, 1998