SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials
Huh, Sungmin, Kim, Hoon, Yoon, Gisung, Choi, Jaehyuck, Lee, Han-Shin, Lee, Dong Gun, Ahn, Byungsup, Seo, Hwan-Seok, Kim, Dongwan, Kim, Seoung Sue, Cho, Han Ku, Watanabe, Takeo, Kinoshita, Hiroo, SchelVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772412
File:
PDF, 523 KB
english, 2008