The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system
P.J Kelly, R.D ArnellVolume:
108-109
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0257-8972(98)00566-0
File:
PDF, 811 KB
english, 1998