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Polymer etching and deposition of amorphous silicon using a VHF coaxial helix plasma source
U. Stephan, K. Richter, J. Kuske, R. GünzelVolume:
112
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(98)00744-0
File:
PDF, 793 KB
english, 1999