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Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system
L Soukup, M Šı́cha, F Fendrych, L Jastrabı́k, Z Hubička, D Chvostová, H Šı́chová, V Valvoda, A Tarasenko, V Studnička, T Wagner, M NovákVolume:
116-119
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0257-8972(99)00129-2
File:
PDF, 212 KB
english, 1999