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Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering
L. Jastrabik, L. Soukup, L.R. Shaginyan, A.A. OnoprienkoVolume:
123
Year:
2000
Language:
english
Pages:
7
DOI:
10.1016/s0257-8972(99)00478-8
File:
PDF, 262 KB
english, 2000