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Remote microwave plasma enhanced chemical vapour deposition of alumina on metallic substrates
M.C. Ntsama-Etoundi, J. Desmaison, P. Tristant, C. TixierVolume:
120-121
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(99)00495-8
File:
PDF, 422 KB
english, 1999