SPIE Proceedings [SPIE 30th European Mask and Lithography Conference - Dresden, Germany (Tuesday 24 June 2014)] 30th European Mask and Lithography Conference - Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications
Behringer, Uwe F. W., Ma, Yuansheng, Torres, J. Andres, Fenger, Germain, Granik, Yuri, Ryckaert, Julien, Vanderberghe, Geert, Bekaert, Joost, Word, JamesVolume:
9231
Year:
2014
Language:
english
DOI:
10.1117/12.2065508
File:
PDF, 982 KB
english, 2014