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Protection of γ-based TiAl against high temperature oxidation using ion implantation of chlorine
U. Hornauer, R. Günzel, H. Reuther, E. Richter, E. Wieser, W. Möller, G. Schumacher, F. Dettenwanger, M. SchützeVolume:
125
Year:
2000
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(99)00544-7
File:
PDF, 288 KB
english, 2000