Ar ion implant damage gettering of generation impurities in silicon employing voltage ramping and nitrogen backscattering
Golja, B., Nassibian, A.G.Volume:
3
Year:
1979
Language:
english
Journal:
IEE Journal on SolidState and Electron Devices
DOI:
10.1049/ij-ssed.1979.0027
File:
PDF, 718 KB
english, 1979