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[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Surface and interface roughness after thermal oxidation of As, B and Si implanted silicon wafers
Raineri, V., Iacona, F., La Via, F., Camalleri, C.M., Rimini, E.Year:
1997
Language:
english
DOI:
10.1109/IIT.1996.586487
File:
PDF, 562 KB
english, 1997