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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - 25 nm immersion lithography at 193 nm wavelength
Smith, Bruce W., Fan, Yongfa, Slocum, Michael, Zavyalova, Lena, Smith, Bruce W.Volume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.602414
File:
PDF, 925 KB
english, 2005