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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride
Liberman, Vladimir, Rothschild, Mordechai, Sedlacek, Jan H. C., Uttaro, Ray S., Bates, Allen K., Van Peski, Chris K., Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354323
File:
PDF, 348 KB
english, 1999