SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Rigorous diffraction analysis using geometrical theory of diffraction for future mask technology
Chua, Gek S., Tay, Cho J., Quan, Chenggen, Lin, Qunying, Smith, Bruce W.Volume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536160
File:
PDF, 273 KB
english, 2004