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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Synthesis and photopolymerization kinetics of a novel oxime ester sulfonic acid photoacid generator
Pang, Yu-Lian, Zou, Ying-Quan, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916239
File:
PDF, 388 KB
english, 2012