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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems
Erdmann, Andreas, Evanschitzky, Peter, Citarella, Giuseppe, Fühner, Tim, De Bisschop, Peter, Hoga, MorihisaVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681872
File:
PDF, 755 KB
english, 2006