Atomic layer deposition of Al 2...

RSC Advances 2015 Vol. 5; Iss. 17

Atomic layer deposition of Al 2 O 3 process emissions

Ma, Lulu, Pan, Dongqing, Xie, Yuanyuan, Yuan, Chris
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Volume:
5
Year:
2015
Language:
english
Journal:
RSC Adv.
DOI:
10.1039/C4RA14568B
File:
PDF, 876 KB
english, 2015
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