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Simulation of P-Type Doping Profile Prediction Using Different Ion Implantation and Diffusion Model
Ningaraju, Vivek, Pramudyo, Antonius Fran Yannu, Sheu, Gene, Kurniawan, Erry Dwi, Yang, Shao Ming, Ma, Jia Wei, Subramanyaj,Volume:
764-765
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.764-765.530
Date:
May, 2015
File:
PDF, 328 KB
english, 2015