![](/img/cover-not-exists.png)
Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation
Hirano, Ryoichi, Iida, Susumu, Amano, Tsuyoshi, Watanabe, Hidehiro, Hatakeyama, Masahiro, Murakami, Takeshi, Yoshikawa, Shoji, Terao, KenjiVolume:
14
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.14.3.033512
Date:
September, 2015
File:
PDF, 2.97 MB
english, 2015