Hybrid lithography: Combining UV-exposure and two photon direct laser writing
Eschenbaum, Carsten, Großmann, Daniel, Dopf, Katja, Kettlitz, Siegfried, Bocksrocker, Tobias, Valouch, Sebastian, Lemmer, UliVolume:
21
Language:
english
Journal:
Optics Express
DOI:
10.1364/OE.21.029921
Date:
December, 2013
File:
PDF, 2.42 MB
english, 2013