Low-loss, flat-topped and spectrally uniform silicon-nanowire-based 5th-order CROW fabricated by ArF-immersion lithography process on a 300-mm SOI wafer
Jeong, Seok-Hwan, Shimura, Daisuke, Simoyama, Takasi, Seki, Miyoshi, Yokoyama, Nobuyuki, Ohtsuka, Minoru, Koshino, Keiji, Horikawa, Tsuyoshi, Tanaka, Yu, Morito, KenVolume:
21
Language:
english
Journal:
Optics Express
DOI:
10.1364/OE.21.030163
Date:
December, 2013
File:
PDF, 1.51 MB
english, 2013