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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Novel single-layer i-line positive resist lift-off process with oxidation step in develop
Zhu, Jianxin, Tomes, Sr., David N., Yaghmaie, Frank, Bell, Rosemary, Sturtevant, John L.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.599176
File:
PDF, 178 KB
english, 2005