Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer
Jeong, Seok-Hwan, Shimura, Daisuke, Simoyama, Takasi, Horikawa, Tsuyoshi, Tanaka, Yu, Morito, KenVolume:
39
Language:
english
Journal:
Optics Letters
DOI:
10.1364/OL.39.003702
Date:
July, 2014
File:
PDF, 731 KB
english, 2014