Impact of implanted phosphorus on the diffusivity of boron...

Journal of Applied Physics 2015 / 07 Vol. 118; Iss. 4

Impact of implanted phosphorus on the diffusivity of boron and its applicability to silicon solar cells

Schrof, Julian, Müller, Ralph, Reedy, Robert C., Benick, Jan, Hermle, Martin
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Volume:
118
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4926764
Date:
July, 2015
File:
PDF, 1.62 MB
english, 2015
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