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[IEEE 2015 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2015.3.15-2015.3.16)] 2015 China Semiconductor Technology International Conference - Uniformity impact on the upstream Electromigration of 40nm low-k Cu interconnect
Zhao, Xiangfu, Zhao, AtmanYear:
2015
Language:
english
DOI:
10.1109/CSTIC.2015.7153448
File:
PDF, 258 KB
english, 2015