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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Intercomparison of SEM, AFM, and electrical linewidths
Villarrubia, John S., Dixson, Ronald G., Jones, Samuel N., Lowney, Jeremiah R., Postek, Jr., Michael T., Allen, Richard A., Cresswell, Michael W., Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350846
File:
PDF, 3.27 MB
english, 1999