Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2015 / 09 Vol. 33; Iss. 5
Energy band alignments of Al2O3–HfO2/Al2O3 nanolaminates–SiO2–p-type Si structures
Rifai, Abdulloh, Maikap, Siddheswar, Nakamura, YoshioVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4931027
Date:
September, 2015
File:
PDF, 2.23 MB
english, 2015