SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Simulation study of repeatability and bias in the CD-SEM
Villarrubia, John S., Vladar, Andras E., Postek, Michael T., Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.485012
File:
PDF, 930 KB
english, 2003