SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Application of model-based library approach to Si3N4 hardmask measurements
Tanaka, Maki, Shishido, Chie, Nagatomo, Wataru, Watanabe, Kenji, Allgair, John A., Raymond, Christopher J.Volume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.772097
File:
PDF, 994 KB
english, 2008