n-Heptane, Carbon Dioxide, and Chlorotrifluoromethane...

Industrial & Engineering Chemistry Fundamentals 1971 / 11 Vol. 10; Iss. 4

n-Heptane, Carbon Dioxide, and Chlorotrifluoromethane Droplet Vaporization Measurements of Supercritical Pressures

Savery, C. William, Juedes, Dennis L., Borman, Gary L.
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Volume:
10
Language:
english
Journal:
Industrial & Engineering Chemistry Fundamentals
DOI:
10.1021/i160040a002
Date:
November, 1971
File:
PDF, 3.45 MB
english, 1971
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