Selective Si Etching Using HCl Vapor

Physica Scripta 2004 / 01 Vol. T114

Selective Si Etching Using HCl Vapor

Isheden, C, Hellström, P E, Radamson, H H, Zhang, S-L, Östling, M
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Volume:
T114
Language:
english
Journal:
Physica Scripta
DOI:
10.1088/0031-8949/2004/T114/026
Date:
January, 2004
File:
PDF, 379 KB
english, 2004
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