Thermal Annealing of Si + Implanted Chemical Vapor Deposition SiO 2
Zheng, Xiang-qin, Liao, Liang-sheng, Yan, Feng, Bao, Xi-mao, Wang, WeiVolume:
13
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/13/5/021
Date:
May, 1996
File:
PDF, 288 KB
english, 1996