Effect of F- and CH-Doped on Dielectric Properties of SiCOH...

Chinese Physics Letters 2005 / 10 Vol. 22; Iss. 10

Effect of F- and CH-Doped on Dielectric Properties of SiCOH Films Deposited by Decamethylcyclopentasiloxane Electron Cyclotron Resonance Plasma

Chao, Ye, Xiao-Zhu, Yu, Ting-Ting, Wang, Zhao-Yuan, Ning, Yu, Xin, Mei-Fu, Jiang
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Volume:
22
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/22/10/059
Date:
October, 2005
File:
PDF, 222 KB
english, 2005
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