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Effect of Trimethyl Aluminium Surface Pretreatment on Atomic Layer Deposition Al 2 O 3 Ultra-Thin Film on Si Substrate
Min, Xu, Hong-Liang, Lu, Shi-Jin, Ding, Liang, Sun, Wei, Zhang, Li-Kang, WangVolume:
22
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/22/9/077
Date:
September, 2005
File:
PDF, 260 KB
english, 2005