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Influence of and on the metallic contamination process of silicon wafers in dilute HF solutions
Bertagna, Valérie, Rouelle, François, Chemla, MariusVolume:
13
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/13/4/016
Date:
April, 1998
File:
PDF, 173 KB
english, 1998