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Absorption and transport properties of Si rich oxide layers annealed at various temperatures
Nesheva, D, Nedev, N, Levi, Z, Brüggemann, R, Manolov, E, Kirilov, K, Meier, SVolume:
23
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/23/4/045015
Date:
April, 2008
File:
PDF, 435 KB
english, 2008