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Influence of plasma-etch damage on the interface states in SOI structures investigated by capacitance–voltage measurements and simulations
Jo, Yeong-Deuk, Koh, Jung-Hyuk, Ha, Jae-Geun, Kim, Ji-Hong, Cho, Dae-Hyung, Moon, Byung-Moo, Koo, Sang-MoVolume:
24
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/24/12/125005
Date:
December, 2009
File:
PDF, 1.05 MB
english, 2009