The influence of the heating rate on the annealing...

Semiconductor Science and Technology 1988 / 10 Vol. 3; Iss. 10

The influence of the heating rate on the annealing behaviour of arsenic-implanted silicon

Hasenack, C M, Souza, J P de, Erichsen, R
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
3
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/3/10/003
Date:
October, 1988
File:
PDF, 449 KB
english, 1988
Conversion to is in progress
Conversion to is failed