Characteristics of titanium silicide formed by Si/Mo/Ti trilayer metallisation
Chiou, Bi-Shiou, Yang, Biing-Jang, Chang, Peng-HengVolume:
4
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/4/3/007
Date:
March, 1989
File:
PDF, 816 KB
english, 1989